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Synthesis of Hyperbranched Polyacetals containing C-(4-t-butylbenz)calix[4]resorcinarene; Resist Properties for Extreme Ultraviolet (EUV) Lithography
http://hdl.handle.net/10112/00020487
http://hdl.handle.net/10112/00020487682164e7-0dc6-4d8d-8b19-c19211f658a1
名前 / ファイル | ライセンス | アクション |
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KU-1100-20181000-01.pdf (865.7 kB)
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Item type | 学術雑誌論文 / Journal Article(1) | |||||
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公開日 | 2020-08-31 | |||||
タイトル | ||||||
タイトル | Synthesis of Hyperbranched Polyacetals containing C-(4-t-butylbenz)calix[4]resorcinarene; Resist Properties for Extreme Ultraviolet (EUV) Lithography | |||||
言語 | ||||||
言語 | eng | |||||
資源タイプ | ||||||
資源タイプ識別子 | http://purl.org/coar/resource_type/c_6501 | |||||
資源タイプ | journal article | |||||
著者 |
Kudo, Hiroto
× Kudo, Hiroto× Fukunaga, Mari× Shiotsuki, Kohei× Takeda, Hiroya× Yamamoto, Hiroki× Kozawa, Takahiro× Watanabe, Takeo |
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著者別名 | ||||||
姓名 | 工藤, 宏人 | |||||
著者別名 | ||||||
姓名 | 福永, 真理 | |||||
著者別名 | ||||||
姓名 | 塩月, 康平 | |||||
著者別名 | ||||||
姓名 | 竹田, 紘也 | |||||
概要 | ||||||
内容記述タイプ | Other | |||||
内容記述 | We synthesized the various hyperbranched polyacetals poly(t-BCRA[4]-co-BVOC), poly(t-BCRA[4]-co-BVOP), poly(t-BCRA[4]-co-BVOXP), poly(t-BCRA[4]-co-BVBC), and poly(t-BCRA[4]-co-TVCH) by polyaddition of C-(4-t-butylbenz)calix[4]resorcinarene (t-BCRA[4]) with 1,4-bis(4-vinyloxy)cyclohexane (BVOC), 1,3-bis(vinyloxy)propane (BVOP), 1,5-bis(vinyloxy)-3-oxapentane (BVOXP), 4,4'-bis(vinyloxy)-1,1'-bicyclohexane (BVBC), and 1,3,5-tris(vinyloxy)cyclohexane (TVCH), respectively. The resist sensitivity of the synthesized polymers using EUV exposure tool was consistent with their structures, and is in the order poly(t-BCRA[4]-co-BVOC) > poly(t-BCRA[4]-co-BVOXP) > poly(t-BCRA[4]-co-TVCH) > poly(t-BCRA[4]-co-BVOP) >> poly(t-BCRA[4]-co-BVBC). Furthermore, poly(t-BCRA[4]-co-BVOC) showed good resist properties such as out-gassing property using EUV exposure tool, film-thickness loss property, and etching durability. Overall, our results indicate that hyperbranched polyacetal poly(t-BCRA[4]-co-BVOC) has high potential as next-generation resist material for EUV photolithography. | |||||
書誌情報 |
Reactive and Functional Polymers 巻 131, p. 1-33, 発行日 2018-10 |
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ISSN | ||||||
収録物識別子タイプ | ISSN | |||||
収録物識別子 | 13815148 | |||||
書誌レコードID | ||||||
収録物識別子タイプ | NCID | |||||
収録物識別子 | AA11059893 | |||||
DOI | ||||||
関連タイプ | isVersionOf | |||||
識別子タイプ | DOI | |||||
関連識別子 | 10.1016/j.reactfunctpolym.2018.08.013 | |||||
権利 | ||||||
権利情報 | ©2020. This manuscript version is made available under the CC-BY-NC-ND 4.0 license http://creativecommons.org/licenses/by-nc-nd/4.0/ | |||||
著者版フラグ | ||||||
出版タイプ | AM | |||||
出版タイプResource | http://purl.org/coar/version/c_ab4af688f83e57aa | |||||
出版者 | ||||||
出版者 | Elsevier | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | positive-type resist | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | main-chain scission type resist | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | hyperbranched polyacetal | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | extreme ultraviolet laser | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | 関西大学 | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | Kansai University |