{"created":"2023-05-15T12:24:21.828620+00:00","id":16436,"links":{},"metadata":{"_buckets":{"deposit":"b80e3841-de1c-4fe9-a29d-0024f45e899d"},"_deposit":{"created_by":10,"id":"16436","owners":[10],"pid":{"revision_id":0,"type":"depid","value":"16436"},"status":"published"},"_oai":{"id":"oai:kansai-u.repo.nii.ac.jp:00016436","sets":["528:1588:1595:1597"]},"author_link":["40495","40499","40490","40494","40496","40492","40491","40489","40497","40493","40498"],"item_9_biblio_info_7":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2018-10","bibliographicIssueDateType":"Issued"},"bibliographicPageEnd":"33","bibliographicPageStart":"1","bibliographicVolumeNumber":"131","bibliographic_titles":[{"bibliographic_title":"Reactive and Functional Polymers"}]}]},"item_9_description_4":{"attribute_name":"概要","attribute_value_mlt":[{"subitem_description":"We synthesized the various hyperbranched polyacetals poly(t-BCRA[4]-co-BVOC), poly(t-BCRA[4]-co-BVOP), poly(t-BCRA[4]-co-BVOXP), poly(t-BCRA[4]-co-BVBC), and poly(t-BCRA[4]-co-TVCH) by polyaddition of C-(4-t-butylbenz)calix[4]resorcinarene (t-BCRA[4]) with 1,4-bis(4-vinyloxy)cyclohexane (BVOC), 1,3-bis(vinyloxy)propane (BVOP), 1,5-bis(vinyloxy)-3-oxapentane (BVOXP), 4,4'-bis(vinyloxy)-1,1'-bicyclohexane (BVBC), and 1,3,5-tris(vinyloxy)cyclohexane (TVCH), respectively. The resist sensitivity of the synthesized polymers using EUV exposure tool was consistent with their structures, and is in the order poly(t-BCRA[4]-co-BVOC) > poly(t-BCRA[4]-co-BVOXP) > poly(t-BCRA[4]-co-TVCH) > poly(t-BCRA[4]-co-BVOP) >> poly(t-BCRA[4]-co-BVBC). Furthermore, poly(t-BCRA[4]-co-BVOC) showed good resist properties such as out-gassing property using EUV exposure tool, film-thickness loss property, and etching durability. Overall, our results indicate that hyperbranched polyacetal poly(t-BCRA[4]-co-BVOC) has high potential as next-generation resist material for EUV photolithography.","subitem_description_type":"Other"}]},"item_9_full_name_3":{"attribute_name":"著者別名","attribute_value_mlt":[{"nameIdentifiers":[{"nameIdentifier":"40496","nameIdentifierScheme":"WEKO"}],"names":[{"name":"工藤, 宏人"}]},{"nameIdentifiers":[{"nameIdentifier":"40497","nameIdentifierScheme":"WEKO"}],"names":[{"name":"福永, 真理"}]},{"nameIdentifiers":[{"nameIdentifier":"40498","nameIdentifierScheme":"WEKO"}],"names":[{"name":"塩月, 康平"}]},{"nameIdentifiers":[{"nameIdentifier":"40499","nameIdentifierScheme":"WEKO"}],"names":[{"name":"竹田, 紘也"}]}]},"item_9_publisher_34":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"Elsevier"}]},"item_9_relation_12":{"attribute_name":"DOI","attribute_value_mlt":[{"subitem_relation_type":"isVersionOf","subitem_relation_type_id":{"subitem_relation_type_id_text":"10.1016/j.reactfunctpolym.2018.08.013","subitem_relation_type_select":"DOI"}}]},"item_9_rights_13":{"attribute_name":"権利","attribute_value_mlt":[{"subitem_rights":"©2020. This manuscript version is made available under the CC-BY-NC-ND 4.0 license http://creativecommons.org/licenses/by-nc-nd/4.0/"}]},"item_9_source_id_10":{"attribute_name":"書誌レコードID","attribute_value_mlt":[{"subitem_source_identifier":"AA11059893","subitem_source_identifier_type":"NCID"}]},"item_9_source_id_8":{"attribute_name":"ISSN","attribute_value_mlt":[{"subitem_source_identifier":"13815148","subitem_source_identifier_type":"ISSN"}]},"item_9_version_type_17":{"attribute_name":"著者版フラグ","attribute_value_mlt":[{"subitem_version_resource":"http://purl.org/coar/version/c_ab4af688f83e57aa","subitem_version_type":"AM"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"Kudo, Hiroto"}],"nameIdentifiers":[{},{}]},{"creatorNames":[{"creatorName":"Fukunaga, Mari"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Shiotsuki, Kohei"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Takeda, Hiroya"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Yamamoto, Hiroki"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Kozawa, Takahiro"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Watanabe, Takeo"}],"nameIdentifiers":[{}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2020-08-31"}],"displaytype":"detail","filename":"KU-1100-20181000-01.pdf","filesize":[{"value":"865.7 kB"}],"format":"application/pdf","licensetype":"license_11","mimetype":"application/pdf","url":{"label":"KU-1100-20181000-01.pdf","url":"https://kansai-u.repo.nii.ac.jp/record/16436/files/KU-1100-20181000-01.pdf"},"version_id":"c4a2af57-21e1-4ebf-a07b-738d0d38bdcb"}]},"item_keyword":{"attribute_name":"キーワード","attribute_value_mlt":[{"subitem_subject":"positive-type resist","subitem_subject_scheme":"Other"},{"subitem_subject":"main-chain scission type resist","subitem_subject_scheme":"Other"},{"subitem_subject":"hyperbranched polyacetal","subitem_subject_scheme":"Other"},{"subitem_subject":"extreme ultraviolet laser","subitem_subject_scheme":"Other"},{"subitem_subject":"関西大学","subitem_subject_scheme":"Other"},{"subitem_subject":"Kansai University","subitem_subject_scheme":"Other"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"eng"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"journal article","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"Synthesis of Hyperbranched Polyacetals containing C-(4-t-butylbenz)calix[4]resorcinarene; Resist Properties for Extreme Ultraviolet (EUV) Lithography","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"Synthesis of Hyperbranched Polyacetals containing C-(4-t-butylbenz)calix[4]resorcinarene; Resist Properties for Extreme Ultraviolet (EUV) Lithography"}]},"item_type_id":"9","owner":"10","path":["1597"],"pubdate":{"attribute_name":"公開日","attribute_value":"2020-08-31"},"publish_date":"2020-08-31","publish_status":"0","recid":"16436","relation_version_is_last":true,"title":["Synthesis of Hyperbranched Polyacetals containing C-(4-t-butylbenz)calix[4]resorcinarene; Resist Properties for Extreme Ultraviolet (EUV) Lithography"],"weko_creator_id":"10","weko_shared_id":-1},"updated":"2023-05-17T01:50:22.824227+00:00"}