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Study on resist performance of chemically amplified molecular resists based on cyclic oligomers
http://hdl.handle.net/10112/11399
http://hdl.handle.net/10112/1139967f9e442-5f80-4873-8b3b-dd265760a0f8
| 名前 / ファイル | ライセンス | アクション |
|---|---|---|
KU-1100-20150214-01.pdf (1.1 MB)
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| Item type | 学術雑誌論文 / Journal Article(1) | |||||
|---|---|---|---|---|---|---|
| 公開日 | 2017-08-02 | |||||
| タイトル | ||||||
| タイトル | Study on resist performance of chemically amplified molecular resists based on cyclic oligomers | |||||
| 言語 | ||||||
| 言語 | eng | |||||
| 資源タイプ | ||||||
| 資源タイプ識別子 | http://purl.org/coar/resource_type/c_6501 | |||||
| 資源タイプ | journal article | |||||
| 著者 |
Yamamoto, Hiroki
× Yamamoto, Hiroki× Kudo, Hiroto× Kozawa, Takahiro |
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| 著者別名 | ||||||
| 識別子Scheme | WEKO | |||||
| 識別子 | 27163 | |||||
| 姓名 | 工藤, 宏人 | |||||
| 概要 | ||||||
| 内容記述タイプ | Other | |||||
| 内容記述 | Novel resist materials are required for lithographic processing with ionization radiation such as extreme ultraviolet (EUV) and electron beam (EB) exposure tools. In this study, we synthesized positive-tone chemically amplified molecular resist materials with pendant adamantyl ester (AD) and cyclohexyl 2-propyl ether moieties based on cyclic oligomers such as noria, calixarene dimer, cyclodextrin, and pillar arene, and we examined the lithographic performances of sensitivity, etching durability, and patterning under EUV and EB exposure. We clarified that the sensitivity of the resist materials was consistent with the structure of the cyclic oligomers, i.e., the hole size of the molecular structure might be an important factor relevant to high-resolution resist materials. We found that chemically amplified molecular resists based on cyclic oligomers such as noria, calixarene dimer, cyclodextrin, and pillar arene are promising candidates for higher-resolution resist materials. | |||||
| 書誌情報 |
Microelectronic Engineering 巻 133, p. 16-22, 発行日 2014-02-05 |
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| ISSN | ||||||
| 収録物識別子タイプ | ISSN | |||||
| 収録物識別子 | 01679317 | |||||
| DOI | ||||||
| 関連タイプ | isVersionOf | |||||
| 識別子タイプ | DOI | |||||
| 関連識別子 | 10.1016/j.mee.2014.11.002 | |||||
| 権利 | ||||||
| 権利情報 | (C) 2014 Elsevier B.V. All rights reserved. | |||||
| 著者版フラグ | ||||||
| 出版タイプ | AM | |||||
| 出版タイプResource | http://purl.org/coar/version/c_ab4af688f83e57aa | |||||
| 出版者 | ||||||
| 出版者 | Elsevier | |||||
| キーワード | ||||||
| 主題Scheme | Other | |||||
| 主題 | Chemically amplified resist | |||||
| キーワード | ||||||
| 主題Scheme | Other | |||||
| 主題 | Extreme ultraviolet | |||||
| キーワード | ||||||
| 主題Scheme | Other | |||||
| 主題 | Molecular resist | |||||
| キーワード | ||||||
| 主題Scheme | Other | |||||
| 主題 | Noria derivative | |||||
| キーワード | ||||||
| 主題Scheme | Other | |||||
| 主題 | Calixarene derivative | |||||
| キーワード | ||||||
| 主題Scheme | Other | |||||
| 主題 | 関西大学 | |||||
| キーワード | ||||||
| 主題Scheme | Other | |||||
| 主題 | Kansai University | |||||
