{"created":"2023-05-15T12:20:50.465213+00:00","id":11547,"links":{},"metadata":{"_buckets":{"deposit":"f6c7ad5d-9123-44b0-9b3e-c628271cf92e"},"_deposit":{"created_by":1,"id":"11547","owners":[1],"pid":{"revision_id":0,"type":"depid","value":"11547"},"status":"published"},"_oai":{"id":"oai:kansai-u.repo.nii.ac.jp:00011547","sets":["528:1588:1595:1597"]},"author_link":["27163","27159","27160","27161"],"item_9_biblio_info_7":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2014-02-05","bibliographicIssueDateType":"Issued"},"bibliographicPageEnd":"22","bibliographicPageStart":"16","bibliographicVolumeNumber":"133","bibliographic_titles":[{"bibliographic_title":"Microelectronic Engineering"}]}]},"item_9_description_4":{"attribute_name":"概要","attribute_value_mlt":[{"subitem_description":"Novel resist materials are required for lithographic processing with ionization radiation such as extreme ultraviolet (EUV) and electron beam (EB) exposure tools. In this study, we synthesized positive-tone chemically amplified molecular resist materials with pendant adamantyl ester (AD) and cyclohexyl 2-propyl ether moieties based on cyclic oligomers such as noria, calixarene dimer, cyclodextrin, and pillar arene, and we examined the lithographic performances of sensitivity, etching durability, and patterning under EUV and EB exposure. We clarified that the sensitivity of the resist materials was consistent with the structure of the cyclic oligomers, i.e., the hole size of the molecular structure might be an important factor relevant to high-resolution resist materials. We found that chemically amplified molecular resists based on cyclic oligomers such as noria, calixarene dimer, cyclodextrin, and pillar arene are promising candidates for higher-resolution resist materials.","subitem_description_type":"Other"}]},"item_9_full_name_3":{"attribute_name":"著者別名","attribute_value_mlt":[{"nameIdentifiers":[{"nameIdentifier":"27163","nameIdentifierScheme":"WEKO"}],"names":[{"name":"工藤, 宏人"}]}]},"item_9_publisher_34":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"Elsevier"}]},"item_9_relation_12":{"attribute_name":"DOI","attribute_value_mlt":[{"subitem_relation_type":"isVersionOf","subitem_relation_type_id":{"subitem_relation_type_id_text":"10.1016/j.mee.2014.11.002","subitem_relation_type_select":"DOI"}}]},"item_9_rights_13":{"attribute_name":"権利","attribute_value_mlt":[{"subitem_rights":"(C) 2014 Elsevier B.V. All rights reserved."}]},"item_9_source_id_8":{"attribute_name":"ISSN","attribute_value_mlt":[{"subitem_source_identifier":"01679317","subitem_source_identifier_type":"ISSN"}]},"item_9_version_type_17":{"attribute_name":"著者版フラグ","attribute_value_mlt":[{"subitem_version_resource":"http://purl.org/coar/version/c_ab4af688f83e57aa","subitem_version_type":"AM"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"Yamamoto, Hiroki"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Kudo, Hiroto"}],"nameIdentifiers":[{},{}]},{"creatorNames":[{"creatorName":"Kozawa, Takahiro"}],"nameIdentifiers":[{}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2019-05-23"}],"displaytype":"detail","filename":"KU-1100-20150214-01.pdf","filesize":[{"value":"1.1 MB"}],"format":"application/pdf","licensetype":"license_note","mimetype":"application/pdf","url":{"label":"KU-1100-20150214-01.pdf","url":"https://kansai-u.repo.nii.ac.jp/record/11547/files/KU-1100-20150214-01.pdf"},"version_id":"cc281c06-63bd-4479-a1c3-0efd8f39bad9"}]},"item_keyword":{"attribute_name":"キーワード","attribute_value_mlt":[{"subitem_subject":"Chemically amplified resist","subitem_subject_scheme":"Other"},{"subitem_subject":"Extreme ultraviolet","subitem_subject_scheme":"Other"},{"subitem_subject":"Molecular resist","subitem_subject_scheme":"Other"},{"subitem_subject":"Noria derivative","subitem_subject_scheme":"Other"},{"subitem_subject":"Calixarene derivative","subitem_subject_scheme":"Other"},{"subitem_subject":"関西大学","subitem_subject_scheme":"Other"},{"subitem_subject":"Kansai University","subitem_subject_scheme":"Other"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"eng"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"journal article","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"Study on resist performance of chemically amplified molecular resists based on cyclic oligomers","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"Study on resist performance of chemically amplified molecular resists based on cyclic oligomers"}]},"item_type_id":"9","owner":"1","path":["1597"],"pubdate":{"attribute_name":"公開日","attribute_value":"2017-08-02"},"publish_date":"2017-08-02","publish_status":"0","recid":"11547","relation_version_is_last":true,"title":["Study on resist performance of chemically amplified molecular resists based on cyclic oligomers"],"weko_creator_id":"1","weko_shared_id":1},"updated":"2023-05-15T15:38:44.736985+00:00"}