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Synthesis and Property of Tannic Acid Derivatives and Their Application for Extreme Ultraviolet Laser Lithography System
http://hdl.handle.net/10112/16259
http://hdl.handle.net/10112/1625918cc0dd0-890b-417c-9af7-86ce6dbf24ea
名前 / ファイル | ライセンス | アクション |
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KU-1100-20180600-00.pdf (123.6 kB)
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Item type | 学術雑誌論文 / Journal Article(1) | |||||
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公開日 | 2018-08-31 | |||||
タイトル | ||||||
タイトル | Synthesis and Property of Tannic Acid Derivatives and Their Application for Extreme Ultraviolet Laser Lithography System | |||||
言語 | ||||||
言語 | eng | |||||
資源タイプ | ||||||
資源タイプ識別子 | http://purl.org/coar/resource_type/c_6501 | |||||
資源タイプ | journal article | |||||
著者 |
Kudo, Hiroto
× Kudo, Hiroto× Ohori, Shizuya× Takeda, Hiroya× Ogawa, Hiroki× Watanabe, Takeo× Yamamoto, Hiroki× Kozawa, Takahiro |
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著者別名 | ||||||
姓名 | 工藤, 宏人 | |||||
著者別名 | ||||||
姓名 | 大堀, 静也 | |||||
著者別名 | ||||||
姓名 | 竹田, 紘也 | |||||
著者別名 | ||||||
姓名 | 小川, 大貴 | |||||
概要 | ||||||
内容記述タイプ | Other | |||||
内容記述 | We synthesized tannic acid derivatives with pendant cyclohexyl acetal moieties (TA-CVEn), butyl acetal moieties (TA-BVEn), and adamantyl ester moieties (TA-ADn) by the reaction of tannnic acid (TA) with cyclohexyl vinyl ether (CVE), butyl vinyl ether (BVE), and adamantyl bromo acetate (AD) in various feeds ratios. The synthesized TA-CVEn, TA-BVEn, and TA-ADn had good solubility, good film-forming ability, and high thermal stability relevant to application of photolithography materials. However, only TA-BVE97 and TA-AD74 can be used as positive-type photo-resist materials using 2.38 wt% TMAH aq. as developer due to the result of thickness loss property. Furthermore, their resist-sensitivity upon EUV exposure tool and etching durability were adequate and they have high potential as next-generation resist material for EUV lithography. | |||||
書誌情報 |
Journal of Photopolymer Science and Technology 巻 31, 号 2, p. 221-225, 発行日 2018-06 |
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ISSN | ||||||
収録物識別子タイプ | ISSN | |||||
収録物識別子 | 13496336 | |||||
ISSN | ||||||
収録物識別子タイプ | ISSN | |||||
収録物識別子 | 09149244 | |||||
DOI | ||||||
関連タイプ | isVersionOf | |||||
識別子タイプ | DOI | |||||
関連識別子 | 10.2494/photopolymer.31.221 | |||||
権利 | ||||||
権利情報 | (C) 2017 The Society of Photopolymer Science and Technology (SPST) | |||||
権利 | ||||||
権利情報 | (C)フォトポリマー学会; このデータはフォトポリマー学会からの許諾を得て公開しています。 | |||||
著者版フラグ | ||||||
出版タイプ | AM | |||||
出版タイプResource | http://purl.org/coar/version/c_ab4af688f83e57aa | |||||
出版者 | ||||||
出版者 | The Society of Photopolymer Science and Technology | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | Tannic acid | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | Positive-type resist | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | Extreme ultraviolet laser | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | 関西大学 | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | Kansai University | |||||
出版者(他言語) | ||||||
フォトポリマー学会 |