{"created":"2023-05-15T12:20:49.071040+00:00","id":11517,"links":{},"metadata":{"_buckets":{"deposit":"e63ad1c8-c3e3-429a-af09-df4f322eba26"},"_deposit":{"created_by":1,"id":"11517","owners":[1],"pid":{"revision_id":0,"type":"depid","value":"11517"},"status":"published"},"_oai":{"id":"oai:kansai-u.repo.nii.ac.jp:00011517","sets":["528:1588:1595:1597"]},"author_link":["26874","26866","26871","26869","26875","26865","26876","26868","26870","26867","26873"],"item_9_biblio_info_7":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2018-06","bibliographicIssueDateType":"Issued"},"bibliographicIssueNumber":"2","bibliographicPageEnd":"225","bibliographicPageStart":"221","bibliographicVolumeNumber":"31","bibliographic_titles":[{"bibliographic_title":"Journal of Photopolymer Science and Technology"}]}]},"item_9_description_4":{"attribute_name":"概要","attribute_value_mlt":[{"subitem_description":"We synthesized tannic acid derivatives with pendant cyclohexyl acetal moieties (TA-CVEn), butyl acetal moieties (TA-BVEn), and adamantyl ester moieties (TA-ADn) by the reaction of tannnic acid (TA) with cyclohexyl vinyl ether (CVE), butyl vinyl ether (BVE), and adamantyl bromo acetate (AD) in various feeds ratios. The synthesized TA-CVEn, TA-BVEn, and TA-ADn had good solubility, good film-forming ability, and high thermal stability relevant to application of photolithography materials. However, only TA-BVE97 and TA-AD74 can be used as positive-type photo-resist materials using 2.38 wt% TMAH aq. as developer due to the result of thickness loss property. Furthermore, their resist-sensitivity upon EUV exposure tool and etching durability were adequate and they have high potential as next-generation resist material for EUV lithography.","subitem_description_type":"Other"}]},"item_9_full_name_3":{"attribute_name":"著者別名","attribute_value_mlt":[{"nameIdentifiers":[{"nameIdentifier":"26873","nameIdentifierScheme":"WEKO"}],"names":[{"name":"工藤, 宏人"}]},{"nameIdentifiers":[{"nameIdentifier":"26874","nameIdentifierScheme":"WEKO"}],"names":[{"name":"大堀, 静也"}]},{"nameIdentifiers":[{"nameIdentifier":"26875","nameIdentifierScheme":"WEKO"}],"names":[{"name":"竹田, 紘也"}]},{"nameIdentifiers":[{"nameIdentifier":"26876","nameIdentifierScheme":"WEKO"}],"names":[{"name":"小川, 大貴"}]}]},"item_9_publisher_34":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"The Society of Photopolymer Science and Technology"}]},"item_9_relation_12":{"attribute_name":"DOI","attribute_value_mlt":[{"subitem_relation_type":"isVersionOf","subitem_relation_type_id":{"subitem_relation_type_id_text":"10.2494/photopolymer.31.221","subitem_relation_type_select":"DOI"}}]},"item_9_rights_13":{"attribute_name":"権利","attribute_value_mlt":[{"subitem_rights":"(C) 2017 The Society of Photopolymer Science and Technology (SPST)"},{"subitem_rights":"(C)フォトポリマー学会; このデータはフォトポリマー学会からの許諾を得て公開しています。"}]},"item_9_source_id_8":{"attribute_name":"ISSN","attribute_value_mlt":[{"subitem_source_identifier":"13496336","subitem_source_identifier_type":"ISSN"},{"subitem_source_identifier":"09149244","subitem_source_identifier_type":"ISSN"}]},"item_9_text_35":{"attribute_name":"出版者（他言語）","attribute_value_mlt":[{"subitem_text_value":"フォトポリマー学会"}]},"item_9_version_type_17":{"attribute_name":"著者版フラグ","attribute_value_mlt":[{"subitem_version_resource":"http://purl.org/coar/version/c_ab4af688f83e57aa","subitem_version_type":"AM"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"Kudo, Hiroto"}],"nameIdentifiers":[{},{}]},{"creatorNames":[{"creatorName":"Ohori, Shizuya"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Takeda, Hiroya"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Ogawa, Hiroki"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Watanabe, Takeo"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Yamamoto, Hiroki"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Kozawa, Takahiro"}],"nameIdentifiers":[{}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2019-05-23"}],"displaytype":"detail","filename":"KU-1100-20180600-00.pdf","filesize":[{"value":"123.6 kB"}],"format":"application/pdf","licensetype":"license_note","mimetype":"application/pdf","url":{"label":"KU-1100-20180600-00.pdf","url":"https://kansai-u.repo.nii.ac.jp/record/11517/files/KU-1100-20180600-00.pdf"},"version_id":"c437f1f4-9c24-4922-bb1b-861b85e4a851"}]},"item_keyword":{"attribute_name":"キーワード","attribute_value_mlt":[{"subitem_subject":"Tannic acid","subitem_subject_scheme":"Other"},{"subitem_subject":"Positive-type resist","subitem_subject_scheme":"Other"},{"subitem_subject":"Extreme ultraviolet laser","subitem_subject_scheme":"Other"},{"subitem_subject":"関西大学","subitem_subject_scheme":"Other"},{"subitem_subject":"Kansai University","subitem_subject_scheme":"Other"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"eng"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"journal article","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"Synthesis and Property of Tannic Acid Derivatives and Their Application for Extreme Ultraviolet Laser Lithography System","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"Synthesis and Property of Tannic Acid Derivatives and Their Application for Extreme Ultraviolet Laser Lithography System"}]},"item_type_id":"9","owner":"1","path":["1597"],"pubdate":{"attribute_name":"公開日","attribute_value":"2018-08-31"},"publish_date":"2018-08-31","publish_status":"0","recid":"11517","relation_version_is_last":true,"title":["Synthesis and Property of Tannic Acid Derivatives and Their Application for Extreme Ultraviolet Laser Lithography System"],"weko_creator_id":"1","weko_shared_id":1},"updated":"2023-05-15T15:38:24.268678+00:00"}