{"created":"2023-05-15T12:20:53.438562+00:00","id":11606,"links":{},"metadata":{"_buckets":{"deposit":"18a7b1a0-9702-42fa-bde7-221cdb1d8fb6"},"_deposit":{"created_by":1,"id":"11606","owners":[1],"pid":{"revision_id":0,"type":"depid","value":"11606"},"status":"published"},"_oai":{"id":"oai:kansai-u.repo.nii.ac.jp:00011606","sets":["528:1588:1595:1597"]},"author_link":["27559","27558","27561","27556","27563","27562","27557","27560"],"item_9_alternative_title_20":{"attribute_name":"その他のタイトル","attribute_value_mlt":[{"subitem_alternative_title":"Laser Desorption/Ionization Mass Spectrometry on Porous Silicon and Its Application to Synthetic Polymers"}]},"item_9_biblio_info_7":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2005-06-05","bibliographicIssueDateType":"Issued"},"bibliographicIssueNumber":"6","bibliographicPageEnd":"447","bibliographicPageStart":"439","bibliographicVolumeNumber":"54","bibliographic_titles":[{"bibliographic_title":"分析化学"}]}]},"item_9_description_4":{"attribute_name":"概要","attribute_value_mlt":[{"subitem_description":"マトリックス支援レーザー脱離イオン化(matrix-assisted laser desorption ionization, MALDI)は, 低分子から高分子に至る様々な化合物のイオン化に有効である.しかしながら, マトリックス関連イオンが強く検出されるためにマススペクトルが複雑になり, 目的イオンの解析が困難な場合がある.また, スペクトルの再現性や定量性に欠け, イオン化の際に試料の酸化還元による分解が起こりやすいという欠点がある.ポーラスシリコンを用いたレーザー脱離イオン化(desorption ionization on silicon, DIOS)は, マトリックスなしでイオン化が可能であるので, ノイズイオンの少ない単純なスペクトルが得られることが期待される.著者らは, DIOSチップ用の電解装置を製作し, DIOS作製の最適条件を決定し, 低質量域において夾(きょう)雑物イオンの影響がほとんどないマススペクトルを得た.そして, DIOS法がいろいろな種類の合成高分子の定量並びに定性分析で有効であることを示した.更に, 銅(II)塩, 有機色素, フェロセン誘導体, リボフラビンを用いてMALDIとDIOSのイオン化機構を調べるために, それらの酸化還元の挙動を検討した.\n\\nDesorption ionization on silicon (DIOS) is a novel matrix-free variant of laser desorption/ionization (LDI) techniques for mass spectrometry. DIOS sample targets or DIOS chips are produced by the electrochemical etching of silicon wafers under light exposure. In the present report, the optimal conditions regarding the resistivity of a silicon wafer, the etching current density and the etching time, for making DIOS chips with good ionization performance are described. The DIOS mass spectra of various kinds of synthetic polymers are compared with the matrix-assisted LDI (MALDI) mass spectra. In the quantitative analysis of mixtures of diol and triol types of polypropyleneglycol (PPG), DIOS provides more reliable data than MALDI under the optimized conditions. The ionization process in DIOS was studied in terms of the redox reaction of the analytes. Copper (II) chloride, some organic dyes and riboflavin, were reduced and some ferrocene derivatives were oxidized as well as MALDI. These results indicated that electron transfer between the analytes and the chip surface occurred in DIOS. The reduction of riboflavin was accelerated using water as a solvent.","subitem_description_type":"Other"}]},"item_9_full_name_3":{"attribute_name":"著者別名","attribute_value_mlt":[{"nameIdentifiers":[{"nameIdentifier":"27560","nameIdentifierScheme":"WEKO"}],"names":[{"name":"Okuno, Shoji"}]},{"nameIdentifiers":[{"nameIdentifier":"27561","nameIdentifierScheme":"WEKO"}],"names":[{"name":"Shimomae, Yukiyasu"}]},{"nameIdentifiers":[{"nameIdentifier":"27562","nameIdentifierScheme":"WEKO"}],"names":[{"name":"Wada, Yoshinao"}]},{"nameIdentifiers":[{"nameIdentifier":"27563","nameIdentifierScheme":"WEKO"}],"names":[{"name":"Arakawa, Ryuichi"}]}]},"item_9_publisher_34":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"日本分析化学会"}]},"item_9_source_id_10":{"attribute_name":"書誌レコードID","attribute_value_mlt":[{"subitem_source_identifier":"AN00222633","subitem_source_identifier_type":"NCID"}]},"item_9_source_id_8":{"attribute_name":"ISSN","attribute_value_mlt":[{"subitem_source_identifier":"05251931","subitem_source_identifier_type":"ISSN"}]},"item_9_version_type_17":{"attribute_name":"著者版フラグ","attribute_value_mlt":[{"subitem_version_resource":"http://purl.org/coar/version/c_970fb48d4fbd8a85","subitem_version_type":"VoR"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"奥野, 昌二"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"下前, 幸康"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"和田, 芳直"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"荒川, 隆一"}],"nameIdentifiers":[{}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2019-05-23"}],"displaytype":"detail","filename":"KU-1100-20050605-03.pdf","filesize":[{"value":"648.1 kB"}],"format":"application/pdf","licensetype":"license_note","mimetype":"application/pdf","url":{"label":"KU-1100-20050605-03.pdf","url":"https://kansai-u.repo.nii.ac.jp/record/11606/files/KU-1100-20050605-03.pdf"},"version_id":"8d9e80b8-7f4e-4577-82ad-8b38ae6f9289"}]},"item_keyword":{"attribute_name":"キーワード","attribute_value_mlt":[{"subitem_subject":"desorption ionization on silicon","subitem_subject_scheme":"Other"},{"subitem_subject":"laser desorption mass spectrometry","subitem_subject_scheme":"Other"},{"subitem_subject":"synthetic polymer","subitem_subject_scheme":"Other"},{"subitem_subject":"redox","subitem_subject_scheme":"Other"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"jpn"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"journal article","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"ポーラスシリコンを用いるレーザー脱離イオン化質量分析の合成高分子への応用","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"ポーラスシリコンを用いるレーザー脱離イオン化質量分析の合成高分子への応用"}]},"item_type_id":"9","owner":"1","path":["1597"],"pubdate":{"attribute_name":"公開日","attribute_value":"2012-01-12"},"publish_date":"2012-01-12","publish_status":"0","recid":"11606","relation_version_is_last":true,"title":["ポーラスシリコンを用いるレーザー脱離イオン化質量分析の合成高分子への応用"],"weko_creator_id":"1","weko_shared_id":-1},"updated":"2023-05-15T19:14:34.263622+00:00"}