{"created":"2023-05-15T12:20:49.025991+00:00","id":11516,"links":{},"metadata":{"_buckets":{"deposit":"ab808499-a81b-4849-92df-05896e8c069f"},"_deposit":{"created_by":1,"id":"11516","owners":[1],"pid":{"revision_id":0,"type":"depid","value":"11516"},"status":"published"},"_oai":{"id":"oai:kansai-u.repo.nii.ac.jp:00011516","sets":["528:1588:1595:1597"]},"author_link":["26862","26861","26859","26860","26864","26863"],"item_9_biblio_info_7":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2017-06-26","bibliographicIssueDateType":"Issued"},"bibliographicIssueNumber":"1","bibliographicPageEnd":"107","bibliographicPageStart":"103","bibliographicVolumeNumber":"30","bibliographic_titles":[{"bibliographic_title":"Journal of Photopolymer Science and Technology"}]}]},"item_9_description_4":{"attribute_name":"概要","attribute_value_mlt":[{"subitem_description":"Synthesis, physical properties, and resist properties of tellurium containing polymer with pendant adamantyl ester groups poly(Re-co-Te)-AD were examined, relevant to the application of resist material for extreme ultraviolet laser photolithography (EUVL) system. A tellurium containing polymer with pendant hydroxyl groups poly(Re-co-Te) was synthesized by the condensation reaction of resorcinol (Re) and tellurium tetrachloride (TeCl4), followed by the condensation reaction with adamantyl bromo acetate to give a corresponding polymer poly(Re-co-Te)-AD. Their physical properties (solubility, film-forming ability, thermal stability) and resist properties (thickness loss property after soaking in 2.38 wt% TMAH aq. solution, out-gassing on EUV exposure tool, and resist sensitivity under EUV exposure tool) were also examined.","subitem_description_type":"Other"}]},"item_9_full_name_3":{"attribute_name":"著者別名","attribute_value_mlt":[{"nameIdentifiers":[{"nameIdentifier":"26863","nameIdentifierScheme":"WEKO"}],"names":[{"name":"福永, 真理"}]},{"nameIdentifiers":[{"nameIdentifier":"26864","nameIdentifierScheme":"WEKO"}],"names":[{"name":"工藤, 宏人"}]}]},"item_9_publisher_34":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"The Society of Photopolymer Science and Technology"}]},"item_9_relation_12":{"attribute_name":"DOI","attribute_value_mlt":[{"subitem_relation_type":"isVersionOf","subitem_relation_type_id":{"subitem_relation_type_id_text":"10.2494/photopolymer.30.103","subitem_relation_type_select":"DOI"}}]},"item_9_rights_13":{"attribute_name":"権利","attribute_value_mlt":[{"subitem_rights":"(C) 2017 The Society of Photopolymer Science and Technology (SPST)"},{"subitem_rights":"(C)フォトポリマー学会; このデータはフォトポリマー学会からの許諾を得て公開しています。"}]},"item_9_source_id_8":{"attribute_name":"ISSN","attribute_value_mlt":[{"subitem_source_identifier":"13496336","subitem_source_identifier_type":"ISSN"},{"subitem_source_identifier":"09149244","subitem_source_identifier_type":"ISSN"}]},"item_9_text_35":{"attribute_name":"出版者（他言語）","attribute_value_mlt":[{"subitem_text_value":"フォトポリマー学会"}]},"item_9_version_type_17":{"attribute_name":"著者版フラグ","attribute_value_mlt":[{"subitem_version_resource":"http://purl.org/coar/version/c_ab4af688f83e57aa","subitem_version_type":"AM"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"Fukunaga, Mari"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Kudo, Hiroto"}],"nameIdentifiers":[{},{}]},{"creatorNames":[{"creatorName":"Yamamoto, Hiroki"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Kozawa, Takahiro"}],"nameIdentifiers":[{}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2019-05-23"}],"displaytype":"detail","filename":"KU-1100-20170626-00.pdf","filesize":[{"value":"179.0 kB"}],"format":"application/pdf","licensetype":"license_note","mimetype":"application/pdf","url":{"label":"KU-1100-20170626-00.pdf","url":"https://kansai-u.repo.nii.ac.jp/record/11516/files/KU-1100-20170626-00.pdf"},"version_id":"99afc5d3-4551-49cf-b7e9-6525657d341d"}]},"item_keyword":{"attribute_name":"キーワード","attribute_value_mlt":[{"subitem_subject":"hyperbranched polyacetal","subitem_subject_scheme":"Other"},{"subitem_subject":"electron beam","subitem_subject_scheme":"Other"},{"subitem_subject":"extreme ultraviolet","subitem_subject_scheme":"Other"},{"subitem_subject":"resist","subitem_subject_scheme":"Other"},{"subitem_subject":"関西大学","subitem_subject_scheme":"Other"},{"subitem_subject":"Kansai University","subitem_subject_scheme":"Other"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"eng"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"journal article","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"Synthesis and Property of Tellurium-Containing Polymer for Extreme Ultraviolet Resist Material","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"Synthesis and Property of Tellurium-Containing Polymer for Extreme Ultraviolet Resist Material"}]},"item_type_id":"9","owner":"1","path":["1597"],"pubdate":{"attribute_name":"公開日","attribute_value":"2018-08-31"},"publish_date":"2018-08-31","publish_status":"0","recid":"11516","relation_version_is_last":true,"title":["Synthesis and Property of Tellurium-Containing Polymer for Extreme Ultraviolet Resist Material"],"weko_creator_id":"1","weko_shared_id":1},"updated":"2023-05-15T15:38:32.944292+00:00"}