@article{oai:kansai-u.repo.nii.ac.jp:00011516,
 author = {Fukunaga, Mari and Kudo, Hiroto and Yamamoto, Hiroki and Kozawa, Takahiro},
 issue = {1},
 journal = {Journal of Photopolymer Science and Technology},
 month = {Jun},
 note = {Synthesis, physical properties, and resist properties of tellurium containing polymer with pendant adamantyl ester groups poly(Re-co-Te)-AD were examined, relevant to the application of resist material for extreme ultraviolet laser photolithography (EUVL) system. A tellurium containing polymer with pendant hydroxyl groups poly(Re-co-Te) was synthesized by the condensation reaction of resorcinol (Re) and tellurium tetrachloride (TeCl4), followed by the condensation reaction with adamantyl bromo acetate to give a corresponding polymer poly(Re-co-Te)-AD. Their physical properties (solubility, film-forming ability, thermal stability) and resist properties (thickness loss property after soaking in 2.38 wt% TMAH aq. solution, out-gassing on EUV exposure tool, and resist sensitivity under EUV exposure tool) were also examined.},
 pages = {103--107},
 title = {Synthesis and Property of Tellurium-Containing Polymer for Extreme Ultraviolet Resist Material},
 volume = {30},
 year = {2017}
}