{"created":"2023-05-15T12:20:48.982801+00:00","id":11515,"links":{},"metadata":{"_buckets":{"deposit":"b1e98eb0-22bd-462a-9940-7257f8f65c3d"},"_deposit":{"created_by":1,"id":"11515","owners":[1],"pid":{"revision_id":0,"type":"depid","value":"11515"},"status":"published"},"_oai":{"id":"oai:kansai-u.repo.nii.ac.jp:00011515","sets":["528:1588:1595:1597"]},"author_link":["26853","26854","26856","26855","26858"],"item_9_biblio_info_7":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2016","bibliographicIssueDateType":"Issued"},"bibliographicIssueNumber":"3","bibliographicPageEnd":"500","bibliographicPageStart":"495","bibliographicVolumeNumber":"29","bibliographic_titles":[{"bibliographic_title":"Journal of Photopolymer Science and Technology"}]}]},"item_9_description_4":{"attribute_name":"概要","attribute_value_mlt":[{"subitem_description":"We examined the condensation polymerization of <i>t</i>-butylcalix[8]arene (BCA[8]), <i>p</i>-<i>t</i>-butylcalix[4]arene (BCA[4]), and C-(4-<i>t</i>-butylbenz)calix[4]resorcinarene (BCRA[4]) with 1,3-adamantane dibromoacetate (ADB), yielding soluble polymers poly(BCA[8]-<i>co</i>-ADB), poly(BCA[4]-<i>co</i>-ADB), and poly(BCRA[4]-<i>co</i>-ADB), respectively. These polymers had good solubility, good film forming ability, and good thermal stability. It was anticipated that these polymers were applicable to positive-type resist materials. However, by the examination on the resist sensitivity using EUV exposure system, these polymers were applicable to negative type resist materials using THF as a developer. Furthermore, a negative clear resist pattern with 100nm resolution could be obtained by EB exposure system. These results indicated that poly(BCA[8]-<i>co</i>-ADB) and poly(BCRA[4]-<i>co</i>-ADB) have high potential to offer higher resolution negative pattern using EUV lithography system.","subitem_description_type":"Other"}]},"item_9_full_name_3":{"attribute_name":"著者別名","attribute_value_mlt":[{"nameIdentifiers":[{"nameIdentifier":"26858","nameIdentifierScheme":"WEKO"}],"names":[{"name":"工藤, 宏人"}]}]},"item_9_publisher_34":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"The Society of Photopolymer Science and Technology"}]},"item_9_relation_12":{"attribute_name":"DOI","attribute_value_mlt":[{"subitem_relation_type":"isIdenticalTo","subitem_relation_type_id":{"subitem_relation_type_id_text":"10.2494/photopolymer.29.495","subitem_relation_type_select":"DOI"}}]},"item_9_rights_13":{"attribute_name":"権利","attribute_value_mlt":[{"subitem_rights":"(C) 2016 SPST"},{"subitem_rights":"本文はフォトポリマー学会の許諾を得て作成しています。"}]},"item_9_source_id_10":{"attribute_name":"書誌レコードID","attribute_value_mlt":[{"subitem_source_identifier":"AA11576862","subitem_source_identifier_type":"NCID"}]},"item_9_source_id_8":{"attribute_name":"ISSN","attribute_value_mlt":[{"subitem_source_identifier":"09149244","subitem_source_identifier_type":"ISSN"}]},"item_9_text_35":{"attribute_name":"出版者（他言語）","attribute_value_mlt":[{"subitem_text_value":"フォトポリマー学会"}]},"item_9_version_type_17":{"attribute_name":"著者版フラグ","attribute_value_mlt":[{"subitem_version_resource":"http://purl.org/coar/version/c_970fb48d4fbd8a85","subitem_version_type":"VoR"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"Kudo, Hiroto"}],"nameIdentifiers":[{"nameIdentifier":"26853","nameIdentifierScheme":"WEKO"},{"nameIdentifier":"30343635","nameIdentifierScheme":"e-Rad","nameIdentifierURI":"https://nrid.nii.ac.jp/ja/nrid/1000030343635"}]},{"creatorNames":[{"creatorName":"Ogawa, Hiroki"}],"nameIdentifiers":[{"nameIdentifier":"26854","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Yamamoto, Hiroki"}],"nameIdentifiers":[{"nameIdentifier":"26855","nameIdentifierScheme":"WEKO"}]},{"creatorNames":[{"creatorName":"Kozawa, Takahiro"}],"nameIdentifiers":[{"nameIdentifier":"26856","nameIdentifierScheme":"WEKO"}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2019-05-23"}],"displaytype":"detail","filename":"KU-1100-20160000-00.pdf","filesize":[{"value":"1.3 MB"}],"format":"application/pdf","licensetype":"license_note","mimetype":"application/pdf","url":{"label":"KU-1100-20160000-00.pdf","url":"https://kansai-u.repo.nii.ac.jp/record/11515/files/KU-1100-20160000-00.pdf"},"version_id":"98acd19f-658b-4d7a-a54f-36acda7a318b"}]},"item_keyword":{"attribute_name":"キーワード","attribute_value_mlt":[{"subitem_subject":"calixarene","subitem_subject_scheme":"Other"},{"subitem_subject":"botryosin","subitem_subject_scheme":"Other"},{"subitem_subject":"electron beam","subitem_subject_scheme":"Other"},{"subitem_subject":"extreme ultraviolet","subitem_subject_scheme":"Other"},{"subitem_subject":"resist","subitem_subject_scheme":"Other"},{"subitem_subject":"関西大学","subitem_subject_scheme":"Other"},{"subitem_subject":"Kansai University","subitem_subject_scheme":"Other"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"eng"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"journal article","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"Synthesis and Resist Properties of Calixarene Polymers with Pendant Haloalkyl Groups","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"Synthesis and Resist Properties of Calixarene Polymers with Pendant Haloalkyl Groups"}]},"item_type_id":"9","owner":"1","path":["1597"],"pubdate":{"attribute_name":"公開日","attribute_value":"2017-06-12"},"publish_date":"2017-06-12","publish_status":"0","recid":"11515","relation_version_is_last":true,"title":["Synthesis and Resist Properties of Calixarene Polymers with Pendant Haloalkyl Groups"],"weko_creator_id":"1","weko_shared_id":1},"updated":"2023-05-15T15:38:40.456860+00:00"}