{"created":"2023-05-15T12:20:48.939695+00:00","id":11514,"links":{},"metadata":{"_buckets":{"deposit":"2497dbe8-980f-4ff0-ad4c-509335f6453f"},"_deposit":{"created_by":1,"id":"11514","owners":[1],"pid":{"revision_id":0,"type":"depid","value":"11514"},"status":"published"},"_oai":{"id":"oai:kansai-u.repo.nii.ac.jp:00011514","sets":["528:1588:1595:1597"]},"author_link":["26849","26852","26846","26847","26848","26851"],"item_9_biblio_info_7":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2015-06-24","bibliographicIssueDateType":"Issued"},"bibliographicIssueNumber":"1","bibliographicPageEnd":"129","bibliographicPageStart":"125","bibliographicVolumeNumber":"28","bibliographic_titles":[{"bibliographic_title":"Journal of Photopolymer Science and Technology"}]}]},"item_9_description_4":{"attribute_name":"概要","attribute_value_mlt":[{"subitem_description":"The synthesized noria-AD offered 40 nm resolution resist pattern with LWR = 9.5 nm in the case of EB exposure tool and a clear 26 nm resolution pattern with LWR = 8.3 nm by means of EUV exposure tool. These results indicate that the present poly(THPE-co-BVOC) would have higher potential to offer higher resolution pattern using EUV lithography system.","subitem_description_type":"Other"}]},"item_9_full_name_3":{"attribute_name":"著者別名","attribute_value_mlt":[{"nameIdentifiers":[{"nameIdentifier":"26851","nameIdentifierScheme":"WEKO"}],"names":[{"name":"工藤, 宏人"}]},{"nameIdentifiers":[{"nameIdentifier":"26852","nameIdentifierScheme":"WEKO"}],"names":[{"name":"松原, 周平"}]}]},"item_9_publisher_34":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"The Society of Photopolymer Science and Technology"}]},"item_9_relation_12":{"attribute_name":"DOI","attribute_value_mlt":[{"subitem_relation_type":"isIdenticalTo","subitem_relation_type_id":{"subitem_relation_type_id_text":"10.2494/photopolymer.28.125","subitem_relation_type_select":"DOI"}}]},"item_9_rights_13":{"attribute_name":"権利","attribute_value_mlt":[{"subitem_rights":"(C) 2015 SPST"},{"subitem_rights":"本文はフォトポリマー学会の許諾を得て作成しています。"}]},"item_9_source_id_10":{"attribute_name":"書誌レコードID","attribute_value_mlt":[{"subitem_source_identifier":"AA11576862","subitem_source_identifier_type":"NCID"}]},"item_9_source_id_8":{"attribute_name":"ISSN","attribute_value_mlt":[{"subitem_source_identifier":"09149244","subitem_source_identifier_type":"ISSN"}]},"item_9_text_35":{"attribute_name":"出版者（他言語）","attribute_value_mlt":[{"subitem_text_value":"フォトポリマー学会"}]},"item_9_version_type_17":{"attribute_name":"著者版フラグ","attribute_value_mlt":[{"subitem_version_resource":"http://purl.org/coar/version/c_970fb48d4fbd8a85","subitem_version_type":"VoR"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"Kudo, Hiroto"}],"nameIdentifiers":[{},{}]},{"creatorNames":[{"creatorName":"Matsubara, Shuhei"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Yamamoto, Hiroki"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Kozawa, Takahiro"}],"nameIdentifiers":[{}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2019-05-23"}],"displaytype":"detail","filename":"KU-1100-20150624-00.pdf","filesize":[{"value":"955.5 kB"}],"format":"application/pdf","licensetype":"license_note","mimetype":"application/pdf","url":{"label":"KU-1100-20150624-00.pdf","url":"https://kansai-u.repo.nii.ac.jp/record/11514/files/KU-1100-20150624-00.pdf"},"version_id":"6f5ef626-056c-4327-9c11-29242c895cc4"}]},"item_keyword":{"attribute_name":"キーワード","attribute_value_mlt":[{"subitem_subject":"hyperbranched polyacetal","subitem_subject_scheme":"Other"},{"subitem_subject":"electron beam","subitem_subject_scheme":"Other"},{"subitem_subject":"extreme ultraviolet","subitem_subject_scheme":"Other"},{"subitem_subject":"resist","subitem_subject_scheme":"Other"},{"subitem_subject":"関西大学","subitem_subject_scheme":"Other"},{"subitem_subject":"Kansai University","subitem_subject_scheme":"Other"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"eng"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"journal article","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"Synthesis and  Resist Properties of Hyperbranched Polyacetals","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"Synthesis and  Resist Properties of Hyperbranched Polyacetals"}]},"item_type_id":"9","owner":"1","path":["1597"],"pubdate":{"attribute_name":"公開日","attribute_value":"2017-06-12"},"publish_date":"2017-06-12","publish_status":"0","recid":"11514","relation_version_is_last":true,"title":["Synthesis and  Resist Properties of Hyperbranched Polyacetals"],"weko_creator_id":"1","weko_shared_id":1},"updated":"2023-05-15T15:38:42.616067+00:00"}