@article{oai:kansai-u.repo.nii.ac.jp:00011514,
 author = {Kudo, Hiroto and Matsubara, Shuhei and Yamamoto, Hiroki and Kozawa, Takahiro},
 issue = {1},
 journal = {Journal of Photopolymer Science and Technology},
 month = {Jun},
 note = {The synthesized noria-AD offered 40 nm resolution resist pattern with LWR = 9.5 nm in the case of EB exposure tool and a clear 26 nm resolution pattern with LWR = 8.3 nm by means of EUV exposure tool. These results indicate that the present poly(THPE-co-BVOC) would have higher potential to offer higher resolution pattern using EUV lithography system.},
 pages = {125--129},
 title = {Synthesis and  Resist Properties of Hyperbranched Polyacetals},
 volume = {28},
 year = {2015}
}