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Synthesis and Property of Tellurium-Containing Polymer for Extreme Ultraviolet Resist Material
http://hdl.handle.net/10112/16257
http://hdl.handle.net/10112/16257131dff15-d7ff-42d7-bb26-f552bf2952be
名前 / ファイル | ライセンス | アクション |
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KU-1100-20170626-00.pdf (179.0 kB)
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Item type | 学術雑誌論文 / Journal Article(1) | |||||
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公開日 | 2018-08-31 | |||||
タイトル | ||||||
タイトル | Synthesis and Property of Tellurium-Containing Polymer for Extreme Ultraviolet Resist Material | |||||
言語 | ||||||
言語 | eng | |||||
資源タイプ | ||||||
資源タイプ識別子 | http://purl.org/coar/resource_type/c_6501 | |||||
資源タイプ | journal article | |||||
著者 |
Fukunaga, Mari
× Fukunaga, Mari× Kudo, Hiroto× Yamamoto, Hiroki× Kozawa, Takahiro |
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著者別名 | ||||||
姓名 | 福永, 真理 | |||||
著者別名 | ||||||
姓名 | 工藤, 宏人 | |||||
概要 | ||||||
内容記述タイプ | Other | |||||
内容記述 | Synthesis, physical properties, and resist properties of tellurium containing polymer with pendant adamantyl ester groups poly(Re-co-Te)-AD were examined, relevant to the application of resist material for extreme ultraviolet laser photolithography (EUVL) system. A tellurium containing polymer with pendant hydroxyl groups poly(Re-co-Te) was synthesized by the condensation reaction of resorcinol (Re) and tellurium tetrachloride (TeCl4), followed by the condensation reaction with adamantyl bromo acetate to give a corresponding polymer poly(Re-co-Te)-AD. Their physical properties (solubility, film-forming ability, thermal stability) and resist properties (thickness loss property after soaking in 2.38 wt% TMAH aq. solution, out-gassing on EUV exposure tool, and resist sensitivity under EUV exposure tool) were also examined. | |||||
書誌情報 |
Journal of Photopolymer Science and Technology 巻 30, 号 1, p. 103-107, 発行日 2017-06-26 |
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ISSN | ||||||
収録物識別子タイプ | ISSN | |||||
収録物識別子 | 13496336 | |||||
ISSN | ||||||
収録物識別子タイプ | ISSN | |||||
収録物識別子 | 09149244 | |||||
DOI | ||||||
関連タイプ | isVersionOf | |||||
識別子タイプ | DOI | |||||
関連識別子 | 10.2494/photopolymer.30.103 | |||||
権利 | ||||||
権利情報 | (C) 2017 The Society of Photopolymer Science and Technology (SPST) | |||||
権利 | ||||||
権利情報 | (C)フォトポリマー学会; このデータはフォトポリマー学会からの許諾を得て公開しています。 | |||||
著者版フラグ | ||||||
出版タイプ | AM | |||||
出版タイプResource | http://purl.org/coar/version/c_ab4af688f83e57aa | |||||
出版者 | ||||||
出版者 | The Society of Photopolymer Science and Technology | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | hyperbranched polyacetal | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | electron beam | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | extreme ultraviolet | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | resist | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | 関西大学 | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | Kansai University | |||||
出版者(他言語) | ||||||
フォトポリマー学会 |