WEKO3
アイテム
{"_buckets": {"deposit": "2497dbe8-980f-4ff0-ad4c-509335f6453f"}, "_deposit": {"created_by": 1, "id": "11514", "owners": [1], "pid": {"revision_id": 0, "type": "depid", "value": "11514"}, "status": "published"}, "_oai": {"id": "oai:kansai-u.repo.nii.ac.jp:00011514", "sets": ["1597"]}, "author_link": ["26849", "26852", "26846", "26847", "26848", "26851"], "item_9_biblio_info_7": {"attribute_name": "書誌情報", "attribute_value_mlt": [{"bibliographicIssueDates": {"bibliographicIssueDate": "2015-06-24", "bibliographicIssueDateType": "Issued"}, "bibliographicIssueNumber": "1", "bibliographicPageEnd": "129", "bibliographicPageStart": "125", "bibliographicVolumeNumber": "28", "bibliographic_titles": [{"bibliographic_title": "Journal of Photopolymer Science and Technology"}]}]}, "item_9_description_4": {"attribute_name": "概要", "attribute_value_mlt": [{"subitem_description": "The synthesized noria-AD offered 40 nm resolution resist pattern with LWR = 9.5 nm in the case of EB exposure tool and a clear 26 nm resolution pattern with LWR = 8.3 nm by means of EUV exposure tool. These results indicate that the present poly(THPE-co-BVOC) would have higher potential to offer higher resolution pattern using EUV lithography system.", "subitem_description_type": "Other"}]}, "item_9_description_42": {"attribute_name": "資源タイプ", "attribute_value_mlt": [{"subitem_description": "Journal Article", "subitem_description_type": "Other"}]}, "item_9_full_name_3": {"attribute_name": "著者別名", "attribute_value_mlt": [{"nameIdentifiers": [{"nameIdentifier": "26851", "nameIdentifierScheme": "WEKO"}], "names": [{"name": "工藤, 宏人"}]}, {"nameIdentifiers": [{"nameIdentifier": "26852", "nameIdentifierScheme": "WEKO"}], "names": [{"name": "松原, 周平"}]}]}, "item_9_publisher_34": {"attribute_name": "出版者", "attribute_value_mlt": [{"subitem_publisher": "The Society of Photopolymer Science and Technology"}]}, "item_9_relation_12": {"attribute_name": "DOI", "attribute_value_mlt": [{"subitem_relation_type": "isIdenticalTo", "subitem_relation_type_id": {"subitem_relation_type_id_text": "10.2494/photopolymer.28.125", "subitem_relation_type_select": "DOI"}}]}, "item_9_rights_13": {"attribute_name": "権利", "attribute_value_mlt": [{"subitem_rights": "(C) 2015 SPST"}, {"subitem_rights": "本文はフォトポリマー学会の許諾を得て作成しています。"}]}, "item_9_source_id_10": {"attribute_name": "書誌レコードID", "attribute_value_mlt": [{"subitem_source_identifier": "AA11576862", "subitem_source_identifier_type": "NCID"}]}, "item_9_source_id_8": {"attribute_name": "ISSN", "attribute_value_mlt": [{"subitem_source_identifier": "09149244", "subitem_source_identifier_type": "ISSN"}]}, "item_9_text_35": {"attribute_name": "出版者(他言語)", "attribute_value_mlt": [{"subitem_text_value": "フォトポリマー学会"}]}, "item_9_version_type_17": {"attribute_name": "著者版フラグ", "attribute_value_mlt": [{"subitem_version_resource": "http://purl.org/coar/version/c_970fb48d4fbd8a85", "subitem_version_type": "VoR"}]}, "item_creator": {"attribute_name": "著者", "attribute_type": "creator", "attribute_value_mlt": [{"creatorNames": [{"creatorName": "Kudo, Hiroto"}], "nameIdentifiers": [{"nameIdentifier": "26846", "nameIdentifierScheme": "WEKO"}, {"nameIdentifier": "30343635", "nameIdentifierScheme": "e-Rad", "nameIdentifierURI": "https://nrid.nii.ac.jp/ja/nrid/1000030343635"}]}, {"creatorNames": [{"creatorName": "Matsubara, Shuhei"}], "nameIdentifiers": [{"nameIdentifier": "26847", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "Yamamoto, Hiroki"}], "nameIdentifiers": [{"nameIdentifier": "26848", "nameIdentifierScheme": "WEKO"}]}, {"creatorNames": [{"creatorName": "Kozawa, Takahiro"}], "nameIdentifiers": [{"nameIdentifier": "26849", "nameIdentifierScheme": "WEKO"}]}]}, "item_files": {"attribute_name": "ファイル情報", "attribute_type": "file", "attribute_value_mlt": [{"accessrole": "open_date", "date": [{"dateType": "Available", "dateValue": "2019-05-23"}], "displaytype": "detail", "download_preview_message": "", "file_order": 0, "filename": "KU-1100-20150624-00.pdf", "filesize": [{"value": "955.5 kB"}], "format": "application/pdf", "future_date_message": "", "is_thumbnail": false, "licensetype": "license_free", "mimetype": "application/pdf", "size": 955500.0, "url": {"label": "KU-1100-20150624-00.pdf", "url": "https://kansai-u.repo.nii.ac.jp/record/11514/files/KU-1100-20150624-00.pdf"}, "version_id": "6f5ef626-056c-4327-9c11-29242c895cc4"}]}, "item_keyword": {"attribute_name": "キーワード", "attribute_value_mlt": [{"subitem_subject": "hyperbranched polyacetal", "subitem_subject_scheme": "Other"}, {"subitem_subject": "electron beam", "subitem_subject_scheme": "Other"}, {"subitem_subject": "extreme ultraviolet", "subitem_subject_scheme": "Other"}, {"subitem_subject": "resist", "subitem_subject_scheme": "Other"}, {"subitem_subject": "関西大学", "subitem_subject_scheme": "Other"}, {"subitem_subject": "Kansai University", "subitem_subject_scheme": "Other"}]}, "item_language": {"attribute_name": "言語", "attribute_value_mlt": [{"subitem_language": "eng"}]}, "item_resource_type": {"attribute_name": "資源タイプ", "attribute_value_mlt": [{"resourcetype": "journal article", "resourceuri": "http://purl.org/coar/resource_type/c_6501"}]}, "item_title": "Synthesis and Resist Properties of Hyperbranched Polyacetals", "item_titles": {"attribute_name": "タイトル", "attribute_value_mlt": [{"subitem_title": "Synthesis and Resist Properties of Hyperbranched Polyacetals"}]}, "item_type_id": "9", "owner": "1", "path": ["1597"], "permalink_uri": "http://hdl.handle.net/10112/11219", "pubdate": {"attribute_name": "公開日", "attribute_value": "2017-06-12"}, "publish_date": "2017-06-12", "publish_status": "0", "recid": "11514", "relation": {}, "relation_version_is_last": true, "title": ["Synthesis and Resist Properties of Hyperbranched Polyacetals"], "weko_shared_id": 1}
Synthesis and Resist Properties of Hyperbranched Polyacetals
http://hdl.handle.net/10112/11219
http://hdl.handle.net/10112/11219b0171db9-b106-4eb9-a428-984d7ce4b539
名前 / ファイル | ライセンス | アクション |
---|---|---|
KU-1100-20150624-00.pdf (955.5 kB)
|
|
Item type | 学術雑誌論文 / Journal Article(1) | |||||
---|---|---|---|---|---|---|
公開日 | 2017-06-12 | |||||
タイトル | ||||||
タイトル | Synthesis and Resist Properties of Hyperbranched Polyacetals | |||||
言語 | ||||||
言語 | eng | |||||
資源タイプ | ||||||
資源タイプ識別子 | http://purl.org/coar/resource_type/c_6501 | |||||
資源タイプ | journal article | |||||
著者 |
Kudo, Hiroto
× Kudo, Hiroto× Matsubara, Shuhei× Yamamoto, Hiroki× Kozawa, Takahiro |
|||||
著者別名 | ||||||
姓名 | 工藤, 宏人 | |||||
著者別名 | ||||||
姓名 | 松原, 周平 | |||||
概要 | ||||||
内容記述タイプ | Other | |||||
内容記述 | The synthesized noria-AD offered 40 nm resolution resist pattern with LWR = 9.5 nm in the case of EB exposure tool and a clear 26 nm resolution pattern with LWR = 8.3 nm by means of EUV exposure tool. These results indicate that the present poly(THPE-co-BVOC) would have higher potential to offer higher resolution pattern using EUV lithography system. | |||||
書誌情報 |
Journal of Photopolymer Science and Technology 巻 28, 号 1, p. 125-129, 発行日 2015-06-24 |
|||||
ISSN | ||||||
収録物識別子タイプ | ISSN | |||||
収録物識別子 | 09149244 | |||||
書誌レコードID | ||||||
収録物識別子タイプ | NCID | |||||
収録物識別子 | AA11576862 | |||||
DOI | ||||||
関連タイプ | isIdenticalTo | |||||
識別子タイプ | DOI | |||||
関連識別子 | 10.2494/photopolymer.28.125 | |||||
権利 | ||||||
権利情報 | (C) 2015 SPST | |||||
権利 | ||||||
権利情報 | 本文はフォトポリマー学会の許諾を得て作成しています。 | |||||
著者版フラグ | ||||||
出版タイプ | VoR | |||||
出版タイプResource | http://purl.org/coar/version/c_970fb48d4fbd8a85 | |||||
出版者 | ||||||
出版者 | The Society of Photopolymer Science and Technology | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | hyperbranched polyacetal | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | electron beam | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | extreme ultraviolet | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | resist | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | 関西大学 | |||||
キーワード | ||||||
主題Scheme | Other | |||||
主題 | Kansai University | |||||
出版者(他言語) | ||||||
フォトポリマー学会 |