Synthesis, physical properties, and resist properties of tellurium containing polymer with pendant adamantyl ester groups poly(Re-co-Te)-AD were examined, relevant to the application of resist material for extreme ultraviolet laser photolithography (EUVL) system. A tellurium containing polymer with pendant hydroxyl groups poly(Re-co-Te) was synthesized by the condensation reaction of resorcinol (Re) and tellurium tetrachloride (TeCl4), followed by the condensation reaction with adamantyl bromo acetate to give a corresponding polymer poly(Re-co-Te)-AD. Their physical properties (solubility, film-forming ability, thermal stability) and resist properties (thickness loss property after soaking in 2.38 wt% TMAH aq. solution, out-gassing on EUV exposure tool, and resist sensitivity under EUV exposure tool) were also examined.
雑誌名
Journal of Photopolymer Science and Technology
巻
30
号
1
ページ
103 - 107
発行年
2017-06-26
ISSN
13496336
09149244
DOI
10.2494/photopolymer.30.103
権利
(C) 2017 The Society of Photopolymer Science and Technology (SPST)
(C)フォトポリマー学会; このデータはフォトポリマー学会からの許諾を得て公開しています。
著者版フラグ
author
出版者
The Society of Photopolymer Science and Technology